The subject of the invention is a method for producing carbon layers containing graphene on nanoparticles, especially in the form of powder and quantum dots, containing at least one semiconductor material, especially on metal oxides or composite materials such as semiconductor and/or metal – i.e. semiconductor-metal composite.
The invention also relates to a reaction vessel for producing carbon layers containing graphene on nanoparticles containing at least one semiconductor material, in particular on metal oxides and composite materials.
The reaction vessel containing the reaction chamber according to the invention enables the deposition of a graphene-containing carbon layer on nanoparticles in a fluidised bed using chemical vapour deposition.
